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´ã´çÀÚ °­À±Á¤ ida0302@hanyang.ac.kr
´ã´çÀÚ ÀüÈ­¹øÈ£ 02-2220-2566
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1. SEM Electron Optics

     - Source Type : Schottky field emitter mounted on the NG hot-swap gun module

     - Landing energies : adjustable 20 A to 30 kA

     - Beam Current : 0.8 pA ~ 100 nA

     - Resolution

        ¡¤ 0.6 nm at 15 kV to 2 kV

        ¡¤ 0.7 nm at 1 kV

        ¡¤ 1.0 nm at 500 V

     - In-lens SE and BSE detection

     - Magnification : x 30 ~ x 1,280,000

     - Maximum horizontal field width : 2.3 mm at beam coincident point

 

2. Focused Ion Beam System

     - Voltage : 500 V to 30 kV

     - 2 IGP pumping system

     - Beam Current : 0.1 pA ~ 65 nA ( 15steps aperture strip )

     - Resolution

        ¡¤ 4.0 nm @ Using preferred statistical method

        ¡¤ 2.5 nm @ Using selective edge method

     - Charge neutralizer technology for ion charge up

     - Detection : Ion Conversion and Electron detector

     - Maximum horizontal field width : 0.9 mm at beam coincident point

 

3. Detectors

     - In-lens SE detector ( TLD-SE )

     - In-lens BSE detector ( TLD-BSE ) 

     - Everhart-Thornley SE detector ( ETD )

     - In-column SE detector ( ICD )

     - In-column BSE detector ( MD )

     - IR camera for viewing sample / column

     - In-chamber sample navigation camera ( Nav-Cam )

     - Retractable low Voltage, high contrast solid-state electron detetros ( DBS )

     - Integrated beam current measurment

 

4. Fiexible 5-axes motorized stage

     - X,Y : 150 mm

     - Z : 10 mm motorized

     - T : - 10 ¡Æ to + 60 ¡Æ

     - R : n x 360 ¡Æ (endless)

     - X, Y repeatability : 1 µm

     - Stage control software includes standard facilities for

        ¡¤ Store and recall of sample position

        ¡¤ Double-click-to-center and drag-to-zoom feature select functions

        ¡¤ Multi-directional stage drive

        ¡¤ Compucentric rotaion

        ¡¤ Image feature alignment to horizontal or veriocal

        ¡¤ Navigaiton on image and navigaion montage is supported with " Click-to-center " and " Drag-to-Zoom " funtions

 

5. Polishing System

     - Surface modification including polishing and cleaning of bulk sample

     - Usde Gas : Ar

     - Adjustable energies : 20 ~ 500 eV

 

6. Deposition Source

     - Platinum (Pt), Carbon (C), Tungsten (W)


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